Fast, Consistent Solenoid for Atomic Layer Deposition
TLX designs solenoids that solve our customers' unique dilemmas. This is an example of how TLX ingenuity was applied in the field.
Atomic layer deposition (ALD) films are applied in uniform, thin layers with atomic-level, repeatable control and complete conformity. The ALD application cycle requires multiple doses of reactive chemicals to be delivered sequentially into the processing chamber.
A pulse of inert gas separates each dose of reactive chemicals, purging the chamber in preparation for the next application. The deposition process required a solution that could operate quickly through the cycles, under maximum pressure and temperature, while maintaining consistency over an extended life (>100 million cycles).
TLX developed a two-position, three-way pilot valve with performance tailored for ALD applications, including ultra-fast response, high operating temperature and compact design. The component used minimal power, making it more cost-effective than competing designs.
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