Atomic Layer Deposition Pilot Valve

TLX developed a two-position, three-way pilot valve with fast response, high operating temperature and compact design. The component consumed minimal power, making it a cost effective solution for ALD applications.

Atomic Layer Deposition Pilot Valve

Typical Applications

  • Proportional pressure or vacuum control
  • EGR control
  • Turbo wastegate control

Features and Benefits

  • Fast response time
  • High operating temperature
  • Two-position, three-way valve
  • Compact design
  • Low power consumption
  • Can be configured with customer interface and power requirements


Operating voltage 12 to 30 Vdc
Operating pressure range 0 to 500 kPa
Operating temperature -40 to 200°C
Operating frequency 100-300 Hz
Resistance 48 +/- 4.8 ohms @ 20°C
Inductance 68.6 mH
Flow Rate 35 l/min @ 80 kPa
Leak Rate < 2 cc/min
PWM pressure control 10-90% duty cycle
PWM vacuum control 10-90% duty cycle
Response time < 6 ms
Burst pressure 50 bar
Vibration 20 G

* All TLX components are customized to fit system requirements, meaning technical specifications are unique to each customer and design, and the examples given here are for illustration purposes only.

Quality Policy

TLX Technologies, LLC will consistently provide products that meet or exceed the requirements of our customers. The company complies with all of the requirements of the ISO 9001:2015 Quality Management System Standard. We will establish, monitor and work to continuously improve customer satisfaction, technology, productivity, quality and employee engagement.