Fast, Consistent Solenoid for Atomic Layer Deposition

TLX developed a two-position, three-way pilot valve with performance tailored for ALD applications, including ultra-fast response, high operating temperature and compact design.

Customer Problem

Atomic layer deposition (ALD) films are applied in uniform, thin layers with atomic-level, repeatable control and complete conformity. A pulse of inert gas separates each dose of reactive chemicals, purging the chamber in preparation for the next application. The deposition process required a solution that could operate quickly through the cycles, under maximum pressure and temperature, while maintaining consistency over an extended life (>100 million cycles).

The TLX Solution

The ALD application cycle requires multiple doses of reactive chemicals to be delivered sequentially into the processing chamber. TLX developed a two-position, three-way pilot valve with performance tailored for ALD applications, including ultra-fast response, high operating temperature and compact design. The component used minimal power, making it more cost-effective than competing designs.

Atomic Layer Deposition Pilot Valve

Specifications
Operating voltage
12 to 30 Vdc
Operating pressure range
0 to 500 kPa
Operating temperature
-40 to 200°C
Operating frequency
100-300 Hz
Resistance
48 +/- 4.8 ohms @ 20°C
Inductance
68.6 mH
Flow Rate
35 l/min @ 80 kPa
Leak Rate
< 2 cc/min
PWM pressure control
10-90% duty cycle
PWM vacuum control
10-90% duty cycle
Response time
< 6 ms
Burst pressure
50 bar
Vibration
20 G

All TLX components are customized to fit system requirements, meaning technical specifications are unique to each customer and design. Examples given on our website are for illustration purposes only.

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